三维连续微结构的实时光刻技术研究

The rapid development of MEMS and MOEMS technique based on micro optics, microelectronics and micro mechanics has a far-reaching impact on the military, industry and the life of the people which we confront in the current century. The photolithographic process from VLSI technique exists in large limitations for the fabrication of micro optical, MEMS and MOEMS elements. In this project, the research on the real-time photolithography technique for the fabrication of 3-D arbitrarily shaped microstructures has been carried out. Combined the advantages of programmable digital LCD system and projection photolithography system, which makes use of the flexibility of the former and the parallelism of the latter, the system of LCD real-time photolithography is proposed and set up through the sufficient investigation. Based on the contour plane and the descritized grey scales, two methods for real-time mask is proposed and the relative software for the techniques is made. The optimal designs for complete continuous microstructures have been developed in this project. The new technique for the shape of deep relief structure through etching SHSG with enzyme is proposed and developed. At last, the microoptical elements such as the micro lens, micro-cylindrical lens array, micro axicon array and so on have been achieved on SHSG through the applications of real-time mask and enzyme etching technique. Through the development of this projects, the conventional photolithography is greatly simplified as a single LCD mask can replace a set of conventional masks. Alignment between different levels of masks in conventional photolithography is no longer necessary if the LCD mask is used. Because the mask design can be adjusted in real time, it is comparatively easy to change the mask design to compensate any nonlinear effects in aerial imaging, in photoresist exposure, development and substrate etching processes. Thus it gives a new and effective path for the fabrication of the arbitrarily shaped microstructure with 3-D continuous relief, and has important significance to the development of microoptics and MOEMS

进行三维连续微结构实时光刻技术的理论和实验研究。引入可编程数字化实时掩模；与投影光刻系统相结合，在光刻材料表面快速产生任意的连续曝光分布；发展干湿法结合的刻蚀技术，在基片上形成高分辩率大深宽比的三维连续微结构器件。新型实时光刻技术具有快速灵活和多功能的特征，将推动微电子、微机械、微光学的交叉融合，促进微系统科学的发展。