微纳、超材料的等离子体形成机理及关键技术基础研究

This project is to aim at the key problems in the synthesis of plasma micronano, meta-materials, the research design and develop novel microplasma array techniques depending on the existing novel plasma techniques, and also develop new MIB (magnetically insulated baffled) probe diagnostic techniques depending on the existing diagnostic techniques, focusing on the generation and control of plasma and plasma formation and modulation in materials as the two main lines. The research of basic physical processes on the discharge, measurement, control and development of novel plasma sources is mainly carried out using a combination of experimental measurements and theoretical calculations. Through diagnostic analysis as well as research on the sheath (including effect of magnetic on sheath), effect of active plasma radicals on nucleation and growth mechanism in micronano structures is explored, meanwhile micro process together with the mechanism of energy and mass deposition in plasma material interaction are also revealed. .By obtaining the novel microplasma array discharge, the associations of external parameter and this plasma discharge are explored, and the mechanism and properties of plasma formation in metamaterials are investigated. Through studying the effects of the electromagnetic wave parameters such as frequency, power, and the incident angle on the structure and properties of different plasma metamaterials, the transmission characteristics of electromagnetic wave in plasma metamaterials are carried out, and the plasma metamaterials are modulated by operational parameters. It is expected to strengthen the understanding of plasma metamaterials, promoting the development of preparation and application technology for metamaterials. It is expected to reveal the nature and transition mechanism of the different discharge modes in various novel plasma sources after relevant research. It is expected to provide a theory basis and technology reference for obtaining the industrial development of controlled micronano-, meta-materials plasma technique. A developing team with key technologies, influential low-temperature plasma physics and applied is nurtured and stabilized. Provide necessary scientific basis，technical and personnel support for research and development of the next generation of new plasma technology in our Country with independent intellectual property rights.

在进一步理解物理内涵的基础上，以创新理论和技术为基础，针对等离子体微纳、超材料合成中的关键问题，围绕等离子体的产生及控制和材料的等离子体形成及调制两大主线，依托现有新型等离子体技术，设计并发展新型阵列微等离子体技术，依托现有诊断技术，发展新型MIB诊断技术；以实验研究为主，实验和模拟相结合，开展等离子体放电产生与测量、控制与发展的基本物理化学过程研究；通过诊断分析和鞘层特性（包括磁场对鞘层的影响）研究，探索等离子体活性基元对微纳结构成核与生长及对材料结构、成分与物理性能的影响，揭示等离子体与材料相互作用中能量和质量沉积的微观过程和机理。通过新型阵列微等离子体放电的实现，确定外部参数与该等离子体放电的关联，探讨等离子体超材料的形成规律；通过电磁波频率、功率、入射角等参数对不同等离子体超材料结构和性质的影响，开展等离子体超材料的电磁波响应特性研究，实现可调等离子体超材料周期性结构和性质的调控。

针对等离子体微纳、超材料合成中的关键问题，围绕等离子体的产生及控制，微纳、超材料的等离子体形成及调制两大主线，在现有装备基础上，设计并搭建了两台线性螺旋波等离子体（HWP）装置，通过天线设计及参数调节形成高参数HWP（密度~1019 m-3，粒子流~1023 m-2 s-1 ，离子束流3.5马赫数）。开展HWP射频匹配特性研究，发展新型探针诊断技术。制备多种微纳薄膜，探索等离子体活性基元对微纳结构成核、生长机理及对材料结构、成分和物理性能的影响。研究表明 13.56MHz磁控溅射制备的TiO2薄膜表面呈颗粒状、均匀而致密；而60MHz磁控溅射的沉积速率很低，适合用于作掺杂功率源。采用RF/HF和RF/LF双频等离子体分别溅射HfO2靶材和Er2O3靶材制备了复合HfErO薄膜，通过HF和LF功率调制Er元素的掺杂量，调制样品结构和性质。通过改变HWP等离子体放电参数，首次实现同一设备高速制备高质量DLC、N-DLC、SiC、垂直石墨烯（VG）以及多壁碳纳米管等薄膜。开展等离子体与材料相互作用研究，表明，氩HWP对钨样品中氮的平均清除效率为1.1×1024 N2m-2h-1，大于传统等离子体壁清洗方法（ICRF）。利用稳态的高通量氮HWP，在低温短时间内（5min）一步合成SiON薄膜，材料表征和等离子体诊断研究表明，样品中N含量与N离子的密度和通量有关，而薄膜厚度与气体温度有关，材料表面的形貌与薄膜的厚度及离子能量有关。采用双频ICP/CCP组合放电,利用C4F8热解SiC实现Si-C键断裂，蒸发硅原子，重组碳原子从而获得石墨烯薄膜。通过微等离子体阵列调制，研究超材料的等离子体形成机理和性质，探索电磁波与微等离子体相互作用，研究二维点缺陷等离子体光子晶体缺陷模的特性，显示其具有良好的可调谐性，实验验证了等离子体在调控谐振频率的良好能力。为等离子体技术发展和微纳、超材料制备提供借鉴。相关HWP等离子体源成功应用于EAST清洗，并得到HWP等离子体源研制的委托研发的资助；发展新型诊断技术，获得认可并获得“近地空间分系统探针系统”的委托研制；通过等离子体对硅片和成品电池进行表面处理，有望实现经济效益。