微弧区间伏安特性对碳基镀层沉积过程与微观结构的影响

Carbon-based antifriction plating coatings with small friction coefficient less than 1×10－2 can be fabricated by Magnetron Sputter Ion Plating (MSIP), but hard to acquire uniform film with thickness deviation in submicron on the products with complicated surface shape for some technology insufficiencies including low ionization rate and poor around plating ability of plating material particle. Based on the plasma knowledge that plating material particle leave-target mechanism will be changed from collide leave-target in sputtering condition to molten spray leave-target in micro-arc environment, this application project is planned to set the volt-ampere characteristics between target and chamber wall at the interval of micro-arc which is controlled by pulse parameters. The synergistic effect mechanism and regulation range of voltage, current, pulse width and frequency for molten spray leave-target of graphite plating material particle will be studied; the influence of substrate bias on deposition rate of graphite plating material particle, film internal stress and adhesive strength between substrate and coating will be investigated; methane will be introduced in the chamber in order to accelerate the deposition rate since more carbon source can be supplied for ionization of methane by using pulse parameters in the micro-arc interval; physical models between gradient structure design of chromium enhanced carbon-based films and film properties including adhesive strength between substrate and coating, film internal stress and tribological characteristics will be built. Research production of this application project can supply theoretical and experimental support for the design of antifriction and anti-aging of precision machine components.

采用磁控溅射离子镀技术虽可制备出摩擦系数小于1×10－2数量级的碳基减摩镀层，但因镀料粒子离化率低、直线飞行致绕镀性差而难以在复杂形状产品表面获得厚度均差控制在亚微米范畴的镀层等技术缺憾。依据真空腔内气体放电状态由辉光演变为弧光时，镀料粒子的脱靶机制将由溅射脱靶转变为热发射脱靶这一等离子体知识，本项申请拟将靶材与真空腔壁之间的伏安特性置于由脉冲参量调控的微弧放电区间，研究可使石墨靶面镀料粒子热发射脱靶的电压、电流、脉宽及频率的协同作用机制与调控范围；揭示热发射条件下，基片偏压对石墨镀料粒子沉积速率、膜内应力及膜基结合强度的影响规律；探讨引入甲烷气体，借助微弧区间脉冲参量使其离化以增强碳源加速镀层沉积的有效性；建立由铬、石墨多靶组合制备铬增强碳基镀层的梯度结构设计与膜基结合强度、膜内应力、工作面摩擦学特性之间物理模型。申请项目的研究成果可为精密机械基础件的“减摩延寿”设计提供理论与实验支持。

针对磁控溅射离子镀（MSIP）过程中镀料粒子离化率低、直线飞行致绕镀性差而难以在复杂形状产品表面获得厚度均差控制在亚微米范畴的镀层等技术缺憾。本项目以碳基厚膜离子镀层为研究对象，通过将靶材与真空腔壁之间的伏安特性置于由脉冲参量调控的微弧放电区间，系统研究了碳基离子镀层沉积过程中溅射粒子产生、粒子输运、于基片沉积成膜的根本过程；并采用表征镀层沉积过程中基材温度与膜基界面下方热影响区的协同作用来研究镀料粒子脉冲供给模式对碳基复合镀层沉积过程中内应力的热释放效果；探讨了引入甲烷气体，借助微弧区间脉冲参量使其离化以增强碳源加速镀层沉积的有效性，并以工业机器人用谐波减速器的核心零部件（柔性内齿轮、刚性外齿轮和十字交叉轴承）和洛轴集团的高精密、静音轴承领域完成小批量测试。本项目的研究成果可为精密机械基础件的“减摩延寿”设计提供理论与实验支持。