特种功能薄膜CVD制备过程热物理研究和新工艺探索

Functional material films are a series of insulating or dielectric films that effectively couple with pressure, temperature, sound, light or other environmental changes. State parameters or environmental changes could be, by functional mterial films, transformed into a new type of energy or conveniently displayed. Chemical Vapor Deposition (CVD) is a normal method in the fabrication of functional material films. Heat and mass transfer, two general thermal physical phenomena, involve in every step of a general CVD process. In our study, material science methods and thermal physical methods were used in investigating in heat and mass transferring process in functional material films, especially for diamond films, fabricated by CVD method. The distribution and changes of temperature and their effect on distribution of reactive radicals in the reactive chamber during the CVD reactive process were investigated by Optical Emission Spectra, Remote Infrared Thermal Meter and Micro Thermal Couples. The heat and mass transferring in the CVD reactive chamber were numerically simulated, and new set-up of the reactor was designed to fabricate high oriented textile diamond films more quickly and stably.

通过材料学科和热物理学科的交叉结合，主动对金刚石等特种功能薄膜CVD制备法中的传热使探醒芯俊２捎枚嘀址椒ú舛ǚ从κ椅露确植己投苑从ζ宸纸獾挠跋欤挥霉夥⑸淦椎确椒ú舛ǜ髦址从诺呐ǘ群涂占浞植迹荒Ｄ夥从κ夷诘拇却使蹋簧杓浦谱骶却视呕姆浼尤刃滦虲VD反应器，提高特种功能薄膜制备的效率和稳定性。