The secondary effluent of antibiotic production wastewater treatment plant contains a lot of refractory organic matters (EfOM). This kind of EfOM is an important medium where the antibiotics and their antibiotic resistance genes (ARGs) existing, and it is also an important pollution sources for introducing antibiotics and ARGs into natural water. Researches have shown that the photochemical properties of EfOM and NOM were different, and EfOM showed higher photochemical activity. So, it is very significant to study the EfOM-involved BLAs and their ARGs photodegradation. However, the role of EfOM in the photodegradation of antibiotics and their ARGs remains unclear, particularly in ARGs. This project is proposed to extract the EfOM in a beta-lactam antibiotics (BLAs) production wastewater treatment plant, and the EfOM will be used in all the subsequent experiments. By using various radiative wavelength band of simulated sunlight, exposed to different gases, add of quenching agent or synergistic agent of free radical, the following three specific goals will be accomplished: 1) Know the mechanism of generation and quenching of reactive oxygen species (ROS) and triplet EfOM when exposed the EfOM to the simulated sunlight; 2) Determine the contribution rate of different ROS in degradation of BLAs and their ARGs; and 3) Identify the fundamental chemical processes of EfOM-involved BLAs and their ARGs photodegradation. The accomplishment of this project is expected to provide a better understanding of the fate of BLAs and their ARGs in aquatic environments. Such studies are also necessary for making effective measures to minimize the risk of BLAs and their ARGs contamination in aquatic environments.
抗生素制药污水二级出水有机质(EfOM)中含有的大量抗生素及其抗性基因(ARGs)是天然水体中该类污染物的重要来源。研究表明,EfOM和NOM的光化学性质迥异但EfOM活性更高。因此研究EfOM存在下抗生素及其ARGs的光降解机理具有重要意义。但对于这一关键因素在抗生素,尤其在ARGs光降解中的作用目前认识尚少,亟需系统深入研究。本项目拟提取某β-内酰胺类抗生素(BLAs)制药污水中的EfOM作为研究对象。综合运用不同辐射波段、预曝气、自由基淬灭剂或增效剂添加等手段,研究该EfOM在BLAs及其ARGs光降解中的作用及机制。研究目标包括:明确EfOM在光照条件下产生、淬灭活性氧物种(ROS)和三线态EfOM的机理;确定不同ROS对BLAs及其ARGs光降解的贡献率;揭示EfOM参与BLAs及其ARGs光降解的机理。本项目将为理解水体中BLAs及其ARGs的归趋和污染控制提供科学依据。
抗生素制药污水二级出水有机质(EfOM)中含有的大量抗生素及其抗性基因(ARGs)是天然水体中该类污染物的重要来源。EfOM和NOM的光化学性质迥异但EfOM活性更高。因此研究EfOM介质中抗生素及其ARGs的光降解机理具有重要意义。但对于这一关键因素在抗生素,尤其在ARGs光降解中的作用目前认识尚少,亟需系统深入研究。本项目提取某β-内酰胺类抗生素(BLAs)制药污水中的EfOM作为研究对象。综合运用不同辐射波段、预曝气、自由基淬灭剂或增效剂添加等手段,研究了EfOM在BLAs及其ARGs光降解中的作用及机制。明确了EfOM在光照条件下产生、淬灭活性氧物种(ROS)和三线态EfOM的机理;确定了不同ROS对BLAs及其ARGs光降解的贡献率;揭示了EfOM参与BLAs及其ARGs光降解的机理。本项目可为理解水体中BLAs及其ARGs的归趋和污染控制提供科学依据。
{{i.achievement_title}}
数据更新时间:2023-05-31
EBPR工艺运行效果的主要影响因素及研究现状
妊娠对雌性大鼠冷防御性肩胛间区棕色脂肪组织产热的影响及其机制
中温固体氧化物燃料电池复合阴极材料LaBiMn_2O_6-Sm_(0.2)Ce_(0.8)O_(1.9)的制备与电化学性质
濒危植物海南龙血树种子休眠机理及其生态学意义
组蛋白去乙酰化酶在变应性鼻炎鼻黏膜上皮中的表达研究
石墨烯基β-内酰胺类抗生素抗性菌新型比色传感方法
抗性基因在抗生素制药废水处理过程的分布特征、消长机制及控制原理
制药废水致耐药性机理及去除工艺研究
四环素抗性基因在天然水中的光降解途径和机理研究