分层离子注入的结构调控提高大尺寸硅微条探测器成品率的机理研究

Silicon micro-strip detectors are employed for vertex detectors and track detectors by the world physical laboratories because of its 10 micron spatial resolution. Our team has manufactured a lot of large-size silicon micro-strip detectors but there are always some detectors which have poor performance, or even completely faile. After the simulation analysis and SIMS analysis for unqualified products, we found that the use of stratified implantation can control the structure of the detectors, thus can significantly improve the strips yield of the silicon micro-strip detectors. The purpose of this project is to further study the influence of stratified implantation on the yield of detectors, and finally design implanation process of silicon micro-strip detectors with high yield.

硅微条探测器凭借其10微米量级的空间分辨相继成为世界各大物理实验室大型实验谱仪上采用的顶点探测器和径迹探测器。但目前我们小组所研制的大尺寸硅微条探测器总是存在部分探测条探测性能差甚至是完全失效的问题，导致成品率相对较低。经过仿真模拟分析及对不合格产品进行SIMS分析，发现利用分层离子注入调控器件结构，可以显著提高硅微条探测器探测条良率。我们小组旨在通过此项目深入研究分层离子注入对探测器成品率的影响机理，最终设计制备高成品率的硅微条探测器的离子注入工艺流程。

硅微条探测器凭借其10微米量级的空间分辨相继成为世界各大物理实验室大型实验谱仪上采用的顶点探测器和径迹探测器。我们小组通过分层离子注入工艺改善了原有工艺大尺寸硅微条探测器部分探测条探测性能差甚至是完全失效的问题，提高了探测器探测条良率。我们通过仿真模拟分析及对不合格产品进行SIMS分析，发现利用分层离子注入调控器件结构，可以显著提高硅微条探测器探测条良率。我们小组通过深入研究分层离子注入对探测器成品率的影响机理，最终确定了制备探测器探测条良率93%以上的离子注入工艺参数。