The optical grade diamond film has extensive applications, especially in the high technique fields. The optical constant is the most important characteristic of the quantity of optical grade diamond film. Studying optical grade diamond film by reflectance difference spectroscopy has its special significance. Using reflectance difference spectroscopy can get the optical constant (n and k) of the film at one wave-length. The presence of stress and anisotropy in thin films is a widespread phenomenon in the preparation process of films. Research of stress and anisotropy in films has attracting many researchers. It is necessary to measure stress and anisotropy in situ in some case. Using reflectance difference spectroscopy can not only quickly and accurately measure the property of the interface under surface of the film, but also can study it in situ. Therefore, our group set up a set of reflectance difference spectroscopy system and develop the software system for experimental data automatically collection. The optical properties of optical grade CVD diamond films have been studied by the reflectance difference spectroscopy system. The Mueller matrix of reflected light has been measured. The anisotropy of a series of optical grade CVD diamond films has been analyzed. And the results show that the films have different optical properties in different deposition conditions. The structure of the films was analyesd by electronic microscopy, Raman microscopy and X-ray diffraction. Effects of substrates on the structural and optical properties of the films were studied.. The thickness of the films can be measured undestroyed by reflectance difference spectroscopy. The thicknesses of a series of optical grade CVD diamond films have been measured using this system. . Studying metal films by reflectance difference spectroscopy has its special significance. Using this system, we have been analysed the optical properties and dielectric properties of the metal films and magnetic films prepared by DC magnetron sputtering and electron-beam evaporation at different deposition conditions. And using the results of x-ray diffraction, electronic microscopy, atomic force microscopy and the four-point probe technique, we study the effects of deposition conditions on the structural and physical properties.The method of studying magnetic property by Kerr effect has got more and more attention. agneto-optic Kerr effect of visible light is very small. Observing magneto-optic Kerr effect of body material with traditional optical methods is very hard. However, it is possible detect agneto-optic Kerr effect by reflectance difference spectroscopy, it is especially effective in detecting magnetism-optical signal of magnetic thin film of atomic level. So we develop the application of reflectance difference spectroscopy; build a magneto-optic Kerr effect analysis system; develop computer interface and software system for automatic collecting experiment data. Using this system we measure the magnetization loops of Ni80Fe20/Cu bilayers and CoFe/Cu bilayers. And using x-ray diffraction, atomic force microscopy (AFM), four-point probe echnique, we have been studied the electric and magnetic properties of Ni80Fe20/Cu and CoFe/Cu bilayers with different thickness Cu buffer layers.
建立埋藏界面与薄模的电子态及微观结构的差分反射分析方法,研究cvd 光学级金刚石薄模捌溆牖捉缑娴奈⒐劢峁购凸庋阅?探索cvd光学级金刚石膜的生长机理..
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数据更新时间:2023-05-31
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