Novel two-level DBD plasma reactor for printing and dyeing wastewater treatment and its degradation mechanism were presented. With internal and external sleeve structure and continuous flow wastewater, two-level DBD plasma was skillfully realized, and the contact area of plasma and wastewater was greatly improved, as well as the mass transfer and the treatment efficiency, which made the plasma technology for wastewater treatment better applied in practice. The effects of reactor structure, discharge parameters, as well as the flow rate and concentration of wastewater on the treatment efficiency and organic contaminants degradation were investigated to optimize the reactor structure and improve the energy efficiency; the gereration mechanism of active particles, the intermediate products and the concentration changes of organic contaminants were studied to obtain the mechanism of wastewater treatment with two-level DBD plasma reactor. The novel two-level DBD plasma reactor was most innovative and forward looking. Once breakthrough progress had been made, the energy consumption would be lowed, and the technology would be industrialized. Wastewater treatment technology with plasma would be expanded from the theory and practice, and a novel high-efficiency way for wastewater treatment was provided.
利用两级放电新型DBD等离子体反应器处理印染废水,并研究其降解机理。通过内外套筒结构及印染废水的连续流动,巧妙地实现了两级介质阻挡放电,有效地提高了等离子体和印染废水的接触面积,改善了质量传递和动量传递,使处理效率提高,为等离子体处理废水应用于实践奠定基础。通过研究反应器结构、等离子体放电参数及废水的流速、浓度等对废水处理效果和有机物降解的影响,优化反应器结构,提高能量利用效率;通过研究等离子体中各种活性粒子的生成机理、分析中间产物和有机污染物的浓度变化,探讨两级DBD等离子体废水处理机理。本研究提出的两级放电新型DBD等离子体反应器未见国内外相关报道,具有原始创新性。本研究一旦取得突破,可以降低能耗,为等离子体处理废水工业化奠定基础。这可以从理论和方法上拓展等离子体废水处理技术,也可以为水处理提供一条新型、高效的途径。
印染废水处理是环保领域的重要课题,其突出问题是色度和难降解有机物的去除问题。首次提出利用新型两级介质阻挡放电(DBD)等离子体反应器连续处理模拟废水和实际废水。通过内外套筒结构及废水的连续流动,巧妙地实现了两级介质阻挡放电,有效地提高了等离子体和废水的接触面积,申请并授权发明专利一项,为等离子体处理废水应用于实践奠定基础。新型两级DBD等离子体反应器对印染废水具有良好的降解效果,铬黑T、亚甲基蓝、甲基橙的降解率均可达到96%以上,亚甲基蓝的COD降解率达到77%。. 以典型的偶氮类染料甲基橙废水为模拟废水,考察了甲基橙的初始pH值、初始质量浓度以及放电电压对甲基橙降解率的影响,新型两级DBD等离子体反应器处理甲基橙的适宜放电电压为13.4kV,较低的初始质量浓度和酸性利于甲基橙的降解。考察了甲基橙pH值、电导率、降解率、化学需氧量(COD)随停留时间的变化,甲基橙废水的pH值随着停留时间的增长而减小,电导率和降解率均随停留时间的增长而增大,甲基橙的COD值随停留时间的增长呈现先减小再升高最后降低趋于平稳的规律。新型两级DBD等离子体反应器处理4L80mg/L甲基橙废水80min后,甲基橙废水的降解率可达94.1%。采用紫外光谱、红外光谱、液质联用对处理前后的甲基橙废水进行检测,处理160min后的甲基橙废水中含有NO3-、HOOCCH2CH2H2CH2CH2SO3-、(CH3)2NCH2CH2CH2CH2CH2COOH等,并推测甲基橙降解机理。. 对于实际印染废水,由于其复杂性,采用沉降-絮凝-两级DBD等离子体处理进行降解。考察絮凝剂种类、用量、絮凝时间、放电电压等对实际废水降解效果和成本的影响,在处理后的实际废水达到排放标准的同时使成本尽量低。. 为了进一步提高实际废水的处理效果并降低处理成本,采用共沉淀法制备了ZnMgAl水滑石作为吸附剂,并用DBD等离子体对其进行了改性。将水滑石用于甲基橙模拟废水处理,考察了等离子体改性时间、甲基橙初始浓度、吸附剂用量对吸附性能的影响,并用X射线衍射、EDS、BET、扫描电镜和红外光谱对其进行了表征。等离子体改性30min、450℃焙烧5h的ZnMgAl水滑石表现了较好的吸附性能,吸附容量达到1327mg/g。
{{i.achievement_title}}
数据更新时间:2023-05-31
钢筋混凝土带翼缘剪力墙破坏机理研究
感应不均匀介质的琼斯矩阵
高压工况对天然气滤芯性能影响的实验研究
空气电晕放电发展过程的特征发射光谱分析与放电识别
硫化矿微生物浸矿机理及动力学模型研究进展
新型多孔陶瓷电极水下大面积均匀放电等离子体放电特性研究及其在印染废水处理中的应用
新型MOFs材料的制备及其对青海藏毯印染废水的处理性能研究
曲霉脱色机理及共固定化处理印染废水的研究
耐盐复合菌系-SMFMBR处理印染废水及其机制研究