基于醇胺化学效应的KDP晶体磁流变抛光机理及应用研究

As a kind of excellent non-linear optic crystal, Potassium Dihydrogen Phosphate (KDP) is the only material that can be used for optical frequency conversion and electro-optical switch in laser inertial confinement fusion and high energy laser weapon. KDP used in engineering should be ultra-smooth and free of defect and impurity, thus it is considered as one of the most difficult optical materials to process due to its anisotropy, low hardness, high brittleness, high deliquescence and extreme sensitivity to temperature changes. In view of the requirement in ultra-precision processing and chemical property of KDP, we prepose a new principle and new technology of controlled non-abrasive magnetorheological finishing by combining the merits of alcohol amine chemical effect and magnetorheological finishing. It is planned to investigate the cooperation effect of weak acid-base reaction and magnetorheological mechanical removal, reveal the processing mechanism of non-subsurface defect ultra-smooth surface, analyze the modulation style of complex reaction to anti-corrosion and anti-residual, and work out the non-residual design scheme. Then, according to the finish experiment of KDP, the chemistry remove effect and anti-residual effect will be optimized, and the processing policy of KDP with high surface quality will be concluded. This project has significant realistic meaning and academic value on accelerating the development of clean nuclear energy and high technology weapon in our country.

磷酸二氢钾（KDP）作为一种优良的非线性光学晶体，在激光惯性约束核聚变和强激光武器的激光倍频和光电开关器件中具有不可替代性。工程应用中要求KDP表层超光滑、无缺陷和无杂质残留，但其易潮解、低硬度、高脆性、各向异性、对温度变化敏感等特点使其成为公认难加工光学元件之一。本项目依托KDP晶体的超精密加工需求，针对其酸式盐化学特性，结合化学效应和磁流变抛光各自特点，探索基于醇胺化学效应的无磨料可控磁流变抛光KDP晶体新原理与新技术。研究弱酸碱化学反应-磁流变机械去除的协同效应，揭示近无亚表面缺陷超光滑表面的形成机理；分析络合反应对羰基铁粉的抗腐蚀和抗残留的调控机制，提出无杂质离子残留加工层的设计方案；进行KDP晶体抛光试验，综合优化醇胺的化学去除作用和抗残留特性，给出高表面质量的KDP抛光工艺策略。研究成果对于加快我国清洁核能和高新技术武器的发展具有重要的现实意义和学术价值。

磷酸二氢钾(KDP)晶体具有优良的非线性光电特性，在清洁核能和高新技术武器领域有着重要的应用前景，但其各向异性、软脆、易潮解、对温度变化敏感等特点使其成为公认难加工光学元件，而超光滑、无亚表面缺陷和无杂质残留的加工要求使其超精密抛光技术面临新的挑战。本项目在磁流变抛光中引入化学手段，主要研究醇胺化学效应在磁流变抛光KDP 中对羰基铁粉的稳定性以及抗杂质残留等特性的作用机理和调控机制。主要内容分为以下方面：（1）弱酸碱化学反应-磁流变机械去除协同机理的研究；（2）络合反应抗腐蚀和抗杂质离子残留的控制机理及调控策略；（3）表面粗糙度控制与抗杂质残留一体化优化设计。研究表明醇胺化学效应去除能力有限，但能够有效缓解铁粉颗粒氧化腐蚀，保证抛光液长期流变稳定性，并弱化KDP表面残留铁离子残留。研究成果对发展交叉学科超精密抛光理论以及高新技术具有重要理论意义和应用价值。