大面积复杂微结构精细光成型方法研究

With the rapid development of MEMS, the large-area microfabrication technique is more widely applied in the field of MEMS. The digital lithography having advantages of short cycle, low cost and high precision has attracted much attention. However, with the gradually increasing requirement for longitudinal depth, complexity, fabrication area and fabrication precision of microstructure, the longitudinal precision and fabrication area of digital lithography have become the key problems which constraint the performance of element or system. Our project aims at the hard problem of precise fabrication of large-area complex microstructure, and digital lithography based on virtual-layer scanning will be proposed. In order to realize fine splicing of large area, the method of scanning optimized virtual layer and building closed-loop control of fabrication system will be explored. On one hand, referring to Optical Proximity Correction (OPC) used in traditional lithography, the error control mechanism for large area splicing based on proportional optimization of the height of virtual layer will be deeply studied. On the other hand, the self-focusing lithography system for large area splicing based on image feedback will be set up. Research result has important scientific significance and will greatly expand the application range of digital lithography. It has wide application prospect in the field of microoptics, MEMS and bionic application.

随着MEMS技术的迅猛发展，大面积微细加工技术在MEMS领域中得到了越来越广泛的应用，短周期、低成本、高精度的数字光成型方法受到了广泛的关注，但随着对微结构纵向深度、复杂程度、制作面积及加工精度的要求日趋升高，数字光成型的纵向精度和制作面积成为制约微结构器件或系统性能的关键问题。本项目瞄准大面积复杂微结构精细制作难题，提出基于虚拟层扫描的复杂微结构光成型方法；借鉴有掩模光学邻近效应校正技术，探索研究基于虚拟层高比例优化的大面积拼接误差抑制机理，构建基于图像反馈的自聚焦精细拼接光成型系统，以期通过优化的虚拟层扫描及制作系统闭环控制两方面抑制拼接误差，实现复杂微结构大面积精细拼接。本项目的研究成果具有重要的科学意义，将拓展数字光成型技术的适用范围，为大面积复杂微结构的短周期、低成本工业化制造提供了一条新的途径，在微光学、MEMS及微纳仿生应用领域具有广阔的应用前景。

随着MEMS技术的迅猛发展，大面积微细加工技术在MEMS领域中得到了越来越广泛的应用，短周期、低成本、高精度的数字光成型方法受到了广泛的关注，但随着对微结构纵向深度、复杂程度、制作面积及加工精度的要求日趋升高，数字光成型的纵向精度和制作面积成为制约微结构器件或系统性能的关键问题。.本项目瞄准大面积复杂微结构精细制作难题，提出了基于虚拟层扫描的二元动态数字掩模光成型方法，确立了相应的基于虚拟层扫描的二元动态数字掩模设计方法，突破了数字光成型方法纵向制作精度受限问题；针对复杂微结构的特殊包络形状，在迭代优化算法基础上发展了一种适用于大多数复杂微结构包络面计算的逐点优化算法，拓展了数字光成型方法的应用范围；构建了基于图像反馈的自聚焦精细拼接光成型系统，融合了优化的虚拟层扫描、制作系统闭环控制、复杂微结构分割优化算法等关键技术，有效抑制了拼接误差，实现了复杂微结构大面积精细拼接。曲面微透镜阵列的仿真和光刻实验验证了上述数字光成型关键技术和方法的有效性。.本项目的研究成果具有重要的科学意义，极大的拓展数字光成型技术的适用范围，为大面积复杂微结构的短周期、低成本工业化精细制造提供了一条新的途径，在微光学、MEMS及微纳仿生应用领域具有广阔的应用前景。