高温稳定非晶SiAlON薄膜的组分调控及其与Pt电极界面特性研究

SiAlON films keeps amorphous state even at high temperatures above 1000℃,which makes it candidate materials in micro-electronics region for surface acoustic wave (SAW) devices, as passivation coatings for thin films Pt electrodes, aiming to avoid its aggregation and function loss at high temperatures. However, basic scientific research containing composition tailoring and relative interface physics interpreting on SiAlON composite films are almost blank.. In this project, the composition tailoring and properties optimization process will be scheduled for SiAlON composite films, by using Si6-zAlzOzN8-z ceramic target with different Al/Si ratio, and by inputting different reaction gas (O2 or N2 or O2/N2 mixtures) during films deposition process. On this basis, the high temperature stability of SiAlON composite films will be investigated and discussed carefully, which including : 1) The amorphous state stability at temperature above 1000℃. 2) The interface reaction of SiAlON films with Pt metal electrode, and the diffusion inhibiting mechanism at temperature above 1000℃..In conclusion, the main target of this program is to realize the composition tailoring and properties optimization of SiAlON films, as well as the study on its high temperature stability and interfaces reaction mechanism with Pt electrode, finally to lay a scientific foundation for its ultimate application in micro-electronics, etc.

SiAlON四元非晶薄膜具有非常优异的高温稳定性，其重要应用之一是作为Pt电极的保护膜应用于表面声学波等微电子器件中，防止Pt薄膜在高温下缩聚失效。然而，关于SiAlON薄膜的四元组分对其高温稳定性的调制关系，特别是其与Pt电极的界面稳定性和稳定机制的研究却十分匮乏。解决上述两个问题，将有利于扩展SiAlON薄膜的应用领域。.本项目拟通过采用不同Al/Si比的SiAlON陶瓷靶材，并在镀膜时通入不同的反应气体(O2, N2, O2/N2混合气)，从而实现SiAlON薄膜的组分调控和性能裁剪。在此基础上，研究SiAlON薄膜的高温稳定性，包括SiAlON薄膜的高温非晶态稳定性及其稳定机制、以及高温下与Pt电极材料的界面稳定性和阻扩散机制。.通过该项目的开展，预期可实现SiAlON薄膜的组分设计和性能优化，揭示其高温非晶态稳定性和界面稳定性机制，为其最终应用奠定科学基础。

本项目主要开展了SiAlON薄膜的组分调控，高温非晶态稳定性研究，高温界面稳定性研究。通过对薄膜制备过程中引入不同的工作气体并调节气体流量，实现薄膜的组分调控和性能优化；开展了高温处理实验(1300-1500℃)，研究了高温处理对SiAlON薄膜的非晶态影响，对薄膜的光学性能及表面形貌的影响；初步开展了SiAlON薄膜与Pt电极材料的界面研究。. 通过项目的执行，实现了对SiAlON薄膜的组分调控和性能优化，获得了高温非晶态稳定性的薄膜样品，SiAlON薄膜在1500℃高温仍保持非晶态稳定性，可以作为高温保护薄膜用于表面声学波器件等。初步开展了SiAlON薄膜与Al2O3基片，SiAlON薄膜与Pt电极材料的界面研究，未后续应用积累了初步经验和数据基础。