大相对孔径高衍射效率消像差凹面光栅的纳米压印-分区摆动刻蚀制作方法研究

The small relative aperture and low diffraction efficiency of aberration corrected concave gratings seriously restricted the development of spectrum instrument with miniaturization, light weight and high signal to noise ratio. There is no effective way to solve the problem. The diffraction efficiency of aberration corrected concave gratings fabricated by existing technologies is less than 50%, and the relative aperture is also less than 0.3. In order to make instruments miniaturization and improve signal to noise ratio, the research of a novel nanoimprint lithography- partition swing etching technology for fabricating large relative aperture, high diffraction efficiency aberration corrected concave gratings is very important. In this project, aberration corrected concave gratings with relative aperture is larger than 0.5, diffraction efficiency higher than 75% will be fabricated by the new paration methods and special technology depend on the transfer of line with aberration correction distribution between concave-convex substrates using UV nanoimprint lithography, blazed angle with high consistency distribution etching by partition swing etching technology. Study on filtration of the lift-off process and the vertex alignment method of concave-convex substrates in UV nanoimprint lithography, the optimal design of etching bands division and the method for elimination of division line between etching bands in partition swing etching technology. Through the breakthrough of these key technologies, a novel design and preparation methods of fabricating aberration corrected concave gratings with large relative aperture and high diffraction efficiency will be established. And an aberration correction flat-field concave grating with caliber φ45mm, radius of curvature 88.4mm, relative aperture 0.5, blazed angle 3° will be fabricated, used in a 110mm×120mm spectrometer.

消像差凹面光栅普遍存在相对孔径小及衍射效率偏低的问题，严重制约了以其为核心元件的小型化、轻量化光谱仪器的发展，且尚无有效办法。现有技术制作的消像差凹面光栅衍射效率低于50%，相对孔径小于0.3。为减小仪器尺寸并提高信噪比，大相对孔径、高衍射效率消像差凹面光栅纳米压印-分区摆动刻蚀制备方法研究尤为必要。本项目探索利用纳米压印在凹面-凸面基底间转移消像差刻线分布实现相对孔径大于0.5凹面光栅的纳米压印复制；着重研究纳米压印过程中凸面-凹面基底顶点对准精度对消像差效果影响规律的数学模型及对准方法关键科学问题；在此基础上，制备φ45mm，曲率半径88.4mm，相对孔径0.5，闪耀角3°的消像差平场凹面光栅。

消像差凹面光栅普遍存在相对孔径小及衍射效率偏低的问题，严重制约了以其为核心元件的小型化、轻量化光谱仪器的发展，且尚无有效办法。现有技术制作的消像差凹面光栅衍射效率低于50%，相对孔径小于0.3。为减小仪器尺寸并提高信噪比，大相对孔径、高衍射效率消像差凹面光栅纳米压印-分区摆动刻蚀制备方法研究尤为必要。本项目探索利用纳米压印在凹面-凸面基底间转移消像差刻线分布实现相对孔径大于0.5凹面光栅的纳米压印复制；着重研究纳米压印过程中凸面-凹面基底顶点对准精度对消像差效果影响规律的数学模型及对准方法关键科学问题；在此基础上，完成3种消像差光栅制备，1种为超环面凹面闪耀光栅、1种为凸面闪耀光栅、1种为凹面罗兰闪耀光栅。这3种光栅均取得应用，在国内5家企业进行试用。