激光溅射和ECR微波放电及离子源结合制备超硬薄膜

Puled laser albation has found wide and successful applications in materials processing and element analysis. Another important application of pulsed laser ablation is for thin film deposition. Since its successful application for the preparation of high-temperature super conducting thin films in the eightieth of the last century, pulsed laser deposition, a film deposition technique based on pulsed laser ablation, has been used to prepare and synthesyze thin films of various materials. Besides, combined with various excitation techniques, novel methods of pulsed laser deposition assisted by reactive source are developed, extending the application of pulsed laser deposition.. In this project, we combined pulsed laser ablation with electron cyclotron resonance (ECR) microwave discharge，Kaufman ion source, arc atom source respectively, forming ECR plasma assisted pulsed laser depotion , ion beam assisted pulsed laser depotion and atom beam pulsed laser deposition. On the basis of the research on mechanisms, these two methods were used for the preparation of various thin films such as diamond-like carbon, carbon nitride, boron carbide and boron carbon nitride with satisfactory results..

脉冲激光溅射（pulsed laser ablation, PLA，或称为脉冲激光烧蚀）在材料刻蚀、成分分析等方面都有广泛而成功的应用，脉冲激光溅射另一个重要的应用方向是薄膜沉积。自从上世纪八十年代基于脉冲激光溅射的薄膜制备方法脉冲激光沉积（pulsed laser depotion, PLD）在高温超导薄膜的制备上获得成功以来，人们已尝试用这一薄膜制备的新技术进行了各种薄膜材料的合成制备，并且PLA和多种其它激励技术结合起来构成了多种活性源辅助的脉冲激光沉积方法，拓展了脉冲激光沉积技术的应用范围。本项目把PLA分别和电子回旋共振（ECR）微波放电技术、Kaufman离子源和弧热原子束结合起来，构成了ECR等离子体辅助脉冲激光沉积、离子束辅助脉冲激光沉积和原子束辅助脉冲激光沉积这几种薄膜制备方法。在机理探讨和研究的基础上，用这两种方法进行了类金刚石薄膜、氮化碳薄膜、碳化硼薄膜和硼碳氮等多种薄膜，得到了很好的效果。.