基于XIL技术的复杂图形光刻技术及其应用研究

Knowledge of cell—material interaction is crucial for fundamental biology and tissue engineering，as well as design and fabrication of advanced biomedical devices．This work has been developed based on the development of nano-fabrication tools such as e-beam lithography (EBL), scanning probe lithography (SPL) and nano imprint lithography (NIL). However, the cost of these techniques is high. For their unique properties in obtaining nanometre-scale periodic lines and dots, extreme ultraviolet soft X-ray interference lithography (XIL) will be the main candidate for periodic nano-fabrication technique with high resolution on large area. However, the structure obtained by XIL is simple and the resist is too thin to be etched. A new parallel direct writing technique based on broad band soft X-ray Talbot lithography is introduced by the author. By controlling the displacement of the sample holder accurately, complex periodic nano-structure on thick resist with large area can be obtained. After pattern transfer, the differentiation of the cells will be observed.

以周期纳米结构为基底，研究基底表面结构对细胞生长分化规律的影响，对于组织工程细胞支架以及医用植入体表面的设计具有重要意义。常规获得高精度周期纳米结构的方法有电子束光刻、纳米压印、扫描探针直写等技术，这些方法在实际应用中多存在成本昂贵，费时且效率不高的缺点。利用极紫外软X 射线干涉光刻（XIL，波长13.4 nm）技术, 可快速获得大面积高密度的周期性纳米线、点阵结构。但XIL技术具有光刻胶薄和曝光图形单一的缺点。以研制大面积、高精度的复杂纳米周期结构并进一步推广其应用为目的，作者在上海光源XIL线站引入基于宽带软X射线泰保效应的复杂图形并行直写光刻技术的概念，在XIL线站实现宽带软X射线厚胶泰保曝光的基础上，在曝光后结合高精度的样品台移动，使得复杂纳米周期图形的大面积排列成为了可能。以此为基底进行图形转移，我们将进一步研究基底材料、结构、周期、占空比及深宽比等参数对细胞生长分化规律的影响。

常规获得高精度周期纳米结构的方法有电子束光刻、纳米压印、扫描探针直写等技术，这些方法在实际应用中多存在成本昂贵，费时且效率不高的缺点。利用极紫外软X 射线干涉光刻（XIL，波长13.4 nm）技术, 可快速获得大面积高密度的周期性纳米线、点阵结构。但XIL技术具有曝光图形单一的缺点。以研制大面积、高精度的复杂纳米周期结构并进一步推广其应用为目的，作者在上海光源XIL线站引入基于宽带软X射线泰保光刻技术的复杂图形并行直写光刻技术的概念，在XIL线站实现大面积低占空比的宽带泰保曝光的基础上，在曝光后结合激光干涉仪控制的高精度的样品台移动，快速高效的制备了线宽低于100 nm，曝光面积为平方毫米的复杂的亚微米周期结构。以此为基底进行图形转移，我们进一步研究了基底结构对细胞生长分化规律的影响。