低能离子注入作物种子胚内的射程分布

基本信息
批准号:19975060
项目类别:面上项目
资助金额:16.00
负责人:卫增泉
学科分类:
依托单位:中国科学院近代物理研究所
批准年份:1999
结题年份:2002
起止时间:2000-01-01 - 2002-12-31
项目状态: 已结题
项目参与者:王志国,党秉荣,李兴林,蔡喜臣
关键词:
放射性束射程分布低能离子注入
结项摘要

110keV 56Fe+1 ions with 5×1016ions/cm2 were used to perpendicularly implant into embryo of spring wheat seeds. The embryo face was broken with fingers into two sections. Electron beams generated by EMS hit the embryo along depth. Intensity of characteristic X-rays from Fe atoms was measured. Distribution of Fe ions with depth was obtained. Result demonstrated that maximum depth of the ions is about 5μm and 0.935μm at peak. The result is basically consistent with previous ones in several methods, but more different from ones of somebody. The result calculated by LSS formula is minimum. It indicates that the calculation program should be recompiled or made a more correction for calculation of range distribution of ion implantation in bio-medium. The result also indicates that induced mutation of seeds is not direct action of the ions themselves and results from some secondary effects caused by ion implantation.

采用Ke-40低能放射性P-32离子,以不同剂量注入作物种子。测定在大、小剂量情况下对离由涑痰挠跋欤胱由涑谭植妓孀⑷牒罄淙词奔涞谋浠=⒆⑷肜胱釉谧魑镏肿幽诜植嫉氖P停栉锢砻枋觥U舛岳斫獾湍芾胱印俺ど涑獭毙вΦ幕怼⑽湍芾胱幼⑷胱魑镉毡溆值挠τ锰峁├砺鄹荩哂兄匾庖濉?.

项目摘要

项目成果
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数据更新时间:2023-05-31

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卫增泉的其他基金

批准号:38870474
批准年份:1988
资助金额:2.50
项目类别:面上项目
批准号:19135022
批准年份:1991
资助金额:12.50
项目类别:重点项目

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