基于调制度辅助显微相位测量偏折术的石墨烯光学表征方法研究

Graphene has attracted much attention in the field of science and technology dueto its excellent physical and chemical properties. How to quickly and efficiently characterize the layer number and structure of graphene is one of the key steps to obtain high quality grapheme. At present, the means of characterization is very limited. In this project, the modulation detection method based on the interference reflection microscopy with structured light illumination and the microdeflectometry are skillfully combined in the samesystem, and modulation assisted microdeflectometry is proposed. The method is applied to the detection of the graphene layer number and the surface sub nanometer scale defects for the first time. This project intends to study the following contents: the theoretical analysis of the characterization of graphene layer numbers and sub nanometer scale defects based on the modulation assisted microscope phase measuring deflectometry, design of optical system structure and parameters, elementary experiment study on characterization of different types of grapheme. The proposed method is a new method and technique for the characterization of the microstructure of grapheme, which has the characteristics of higher sensitivity, higher resolution and more sensive to sub-nanometer defect. The research results can not only enrich the methods for the characterization of the layers and defects of the two-dimensional atomic crystals such as graphene, but also promote the development of optical surface quality detection methods in the field of microscopy.

石墨烯由于其出色的物理化学性质，在科学和技术领域得到了广泛的关注。如何快速有效表征石墨烯的层数和结构是获得高质量石墨烯的关键步骤之一，目前表征手段还十分有限。本项目将基于结构光照明的干涉反射调制度层数检测方法和显微相位测量偏折术巧妙地在同一系统中有机结合，提出一种调制度辅助显微相位测量偏折术，并将该方法首次用于石墨烯层数及表面亚纳米尺度缺陷的检测。本项目拟研究如下内容：基于调制度辅助显微相位测量偏折术石墨烯层数及亚纳米尺度缺陷表征方法的理论分析；系统光路结构、参数进行设计；开展不同类型石墨烯表征的初步实验研究。调制度辅助显微相位测量偏折术是一种表征石墨烯微观结构的新方法、新技术，将具有更高的横向分辨率、更高的对比度、更敏感的缺陷检测特性。研究成果不仅可丰富石墨烯等二维原子晶体层数与缺陷表征方法，还将推动显微领域的光学表面质量检测方法发展。

石墨烯由于其出色的物理化学性质，在科学和技术领域得到了广泛的关注。如何快速有效表征石墨烯的层数和结构是获得高质量石墨烯的关键步骤之一，目前表征手段还十分有限。本项目将基于反射结构光照明的调制度检测方法和显微相位测量偏折术巧妙地在同一系统中有机结合，提出一种调制度辅助显微相位测量偏折术，并将该方法首次用于石墨烯层数及表面亚纳米尺度缺陷的检测。本项目的研究如下内容：基于调制度辅助显微相位测量偏折术石墨烯层数及亚纳米尺度缺陷表征方法的理论分析；系统光路结构、参数进行设计与优化；基于调制度辅助显微相位测量偏折术石墨烯层数及亚纳米尺度缺陷表征的初步实验研究。在研究过程中，分析研究了结构光照明与干涉反射式显微技术有机结合的机理，提出一种基于结构光的干涉反射式光学薄膜显微测量方法。基于Zemax软件进行了系统光路结构与参数仿真分析，研究了斜率-高度多义性问题，提出了采用远心成像系统与同轴光路相结合方法减少测量误差。最后，通过调制度辅助显微相位测量偏折术石墨烯层数及亚纳米尺度缺陷表征的初步实验研究的实验结果，初步说明了显微相位测量偏折术系统具有对二氧化硅基底上石墨烯薄膜的层数检测能力，其调制度图像上不同区域间对比度与石墨烯薄膜的层数近似成正比关系。调制度辅助显微相位测量偏折术是一种表征石墨烯微观结构的新方法、新技术，具有高灵敏度、无损、全场、快速、直观的特点。研究成果不仅可丰富石墨烯等二维原子晶体层数与缺陷表征方法，还将会推动显微领域的光学表面质量检测方法发展。