基于样品旋转的导模干涉亚波长结构刻写研究

Subwavelength structures have found numerous applications in different fields of micro-nano optics, and fabrication technologies of the subwavelength scale arouse widespread attention in researchers. The applicant in this project intends to fabricate various subwavelength structures theoretically based on sample rotation by exciting the interference fields of the waveguide modes in an asymmetric metal-cladding dielectric waveguide structure to expose the resist. Using theoretical investigation, rotation matrix, and numerical simulation, the relationships between the shape and size, arrangement, and period of subwavelength structures fabricated by multi-exposure of waveguide modes interference lithography will be studied along with the rotation angle, resist thickness, and the employed waveguide modes under the condition of rotation of the sample by a specific angle. The relationships between the period, duty cycle, annular belt width, the number of layers of the subwavelength circle grating fabricated by waveguide modes interference lithography, resist thickness, and the employed waveguide modes will be investigated under the condition of continuous rotation and exposure of the sample. This project aims to reveal the physical mechanism of fabrication of subwavelength structures by waveguide modes interference lithography based on sample rotation, and to theoretically develop a subwavelength lithography technology that has advantages of low cost, simple operation, and large area fabrication.

亚波长结构广泛应用于微纳光学的各个领域，其刻写制备是研究人员关注的重点。本项目中，申请人拟基于样品旋转，通过激发非对称金属包覆介质波导结构中的导模干涉场曝光光刻胶，从理论上实现各种亚波长结构的刻写。通过理论分析、旋转矩阵和数值模拟，研究样品旋转特定角度条件下，导模干涉多次曝光刻写亚波长点阵结构的形状和尺寸、排列方式和周期与旋转角度、光刻胶厚度、曝光所用导模间的关系；研究样品连续旋转曝光条件下，导模干涉刻写亚波长圆光栅的周期、占空比、环带宽度、层数与光刻胶厚度和刻写导模之间的关系。揭示基于样品旋转，导模干涉刻写各种亚波长结构的物理机理，从理论上发展一种成本低廉、操作简单、大面积刻写的亚波长光刻技术。

亚波长结构广泛应用于微纳光学等各领域，其刻写制备是研究人员关注的重点。本项目围绕样品旋转条件下，非对称金属包覆介质波导结构中的导模干涉场刻写各种二维和三维亚波长结构展开相关工作，研究按计划顺利执行，取得了预期成果。利用棱镜耦合激发金属薄膜、光刻胶薄膜和空气构成的非对称金属包覆介质波导结构中的导模，通过对样品实施旋转操作和多次导模干涉曝光，分别在100nm量级、1um量级和10um量级厚度的光刻胶条件下，实现了各种二维亚波长点阵结构、亚波长圆光栅，三维亚波长点阵结构、多层亚波长圆光栅，亚波长纳米孔阵列的刻写。得到了对样品实施特定旋转，导模干涉曝光样品刻写制备各种亚波长结构的物理规律；得到了刻写的二维亚波长点阵结构的形状和尺寸、排列方式和周期，亚波长圆光栅的周期与光刻胶厚度、刻写所用低阶导模之间的关系；得到了刻写三维亚波长点阵结构的形状和尺寸、排列方式和周期与光刻胶厚度、刻写所用高阶导模之间的关系；得到了更高阶导模干涉刻写亚波长纳米孔阵列的规律。通过对样品实施旋转操作和改变光刻胶的厚度，利用非对称金属包覆介质波导结构中的各种导模干涉，从理论上实现了一种成本低廉、操作简单、刻写结构多样化的大面积亚波长光刻技术。亚波长结构的形状、尺寸、排列方式和周期可通过光刻胶厚度、对样品实施的旋转操作、曝光选用的导模等进行有效调控。本项目发现的科学规律，对推进亚波长光刻技术和微纳光学的发展均有重要的意义。. 在本研究项目经费资助下，已完成并发表研究论文15篇，其中，SCI收录14篇，1篇论文被评为“中国物理学会2021年度最有影响论文”；获授权发明专利2项（转让1项）；参加国内外学术会议14人次，做报告4人次；培养毕业硕士研究生6名，优秀本科毕业生4名。