晶态碳氮涂层的两步法可控制备和摩擦磨损性能研究

Based on the synthesis crystalline carbon nitride coating exist lower nitrogen content, small sp3 C-N atom bond structure, poor crystalline in carbon nitride film. The project plans to adopt two step method ( specific ion enhancement magnetron sputtering and thermal annealing) prepared crystalline carbon nitride coating. Intends to focus on the following systematic research: the relationship between direct current gas discharge and ion enhancement magnetron sputtering shine, crystalline mechanism and nitrogen content evolvement of carbon nitride coating in rapid thermal annealing process, design and synthesis high nitrogen content carbon nitride coating, tribological and mechanical behaviors of carbon nitride. through searching and analyzing the document, we found that based on the ion enhancement magnetron sputtering can improving the nitrogen content and C-N bond structure, and the thermal annealing can cause the films transform from amorphous to the crystalline. Therefore, the project is with the theoretical basis and feasibility, through the specific ion enhancement magnetron sputtering deposit high N content carbon nitride film, and crystallize thermal annealing treatment in the N2 of carbon nitrde film, the theoretical mechanism of caoting crystallize thermal annealing will be established from the intrinsic factors (as films microstructure) and external factors(as environment and industrial parameter )

本项目针对合成晶态碳氮涂层中氮含量低、C-N原子成键结构不理想（sp3 C-N键含量低下）、涂层结晶状态差等主要问题。拟采用离子增强磁控溅射沉积联合高温快速退火结晶处理两步法制备晶态碳氮涂层，重点在以下方面系统研究：直流气体放电与离子增强磁控溅射沉积羽辉的交互作用，快速退火处理过程中结晶态CNx涂层组织结构和氮含量演变规律，高含氮量CNx涂层的设计和可控制备研究，碳氮涂层的力学和摩擦学性能研究，文献检索发现建立在等离子体反应机制之上的磁控溅射方法，在涂层沉积过程中若能增强等离子体内部的粒子交互作用，涂层氮含量和C-N原子成键结构将得到改善，而且高温退火处理可以促进薄膜从无定形态向晶态转变。因此，项目提出采用特定简单的离子增强磁控溅射沉积技术获得高氮含量涂层，通过涂层N2气氛下退火结晶处理得到晶态碳氮涂层，从内因（材料微观结构）和外因（环境因素，工艺参数）两方面建立碳氮薄膜的结晶退火机制

本项目针对合成晶态碳氮涂层中氮含量低、C-N原子成键结构不理想（sp3 C-N键含量低下）、涂层结晶状态差等主要问题。采用磁控溅射沉积联合高温快速退火结晶处理两步法制备晶态碳氮涂层，重点在以下方面系统研究：直流气体放电与离子增强磁控溅射沉积羽辉的交互作用，快速退火处理过程中结晶态CNx涂层组织结构和氮含量演变规律，高含氮量CNx涂层的设计和可控制备研究，碳氮涂层的力学和摩擦学性能研究，文献检索发现建立在等离子体反应机制之上的磁控溅射方法，在涂层沉积过程中若能增强等离子体内部的粒子交互作用，涂层氮含量和C-N原子成键结构将得到改善，而且高温退火处理可以促进薄膜从无定形态向晶态转变。因此，项目提出采用特定简单的离子增强磁控溅射沉积技术获得高氮含量涂层，通过涂层N2气氛下退火结晶处理得到晶态碳氮涂层，从内因（材料微观结构）和外因（环境因素，工艺参数）两方面建立碳氮薄膜的结晶退火机制