一维聚合物纳米结构阵列的iCVD制备与形成机理探究

One-dimensional polymer nanostructure arrays (PNAs) have important potential applications in various fields. However, unlike the well-established research on their inorganic counterpart, current research on PNAs is still in need of effective fabrication strategies and in-depth understanding on their formation mechanism. Initiated chemical vapor deposition (iCVD) is known for its all-dry, mild and controllable process. In this proposal, we plan to exploit the merits of iCVD, and use the technique of hybrid grafting to fabricate PNAs. The fabrication process proceeds by first depositing a highly crosslinked polymer thin film to achieve high density of living surface radicals, followed by the introduction of supersaturated monomer vapor to induce nucleation. The deposition conditions will then be adjusted to induce preferential growth of nuclei in the axial direction, which leads to the formation of nanostructure arrays. The project will be conducted in the following four aspects: the controllable fabrication of PNAs, the research on the formation mechanism, the exploration of its application, and the expansion of this method to more material systems. By implementing this project, we expect to achieve a novel fabrication method of PNAs, establish a complete theory on the formation mechanism of iCVD fabrication of PNAs, and develop an all-dry, substrate-independent, one-step fabrication method of superhydrophobic, anti-biofouling nanocoatings. The study on the fabrication of iCVD PNAs and its formation mechanism is also expected to pave the way for future research on vapor-based fabrication of polymer nanomaterials.

一维聚合物纳米结构阵列在诸多领域有着广泛而重要的潜在应用。但与无机纳米结构阵列相比，目前聚合物纳米结构阵列仍缺少有效的制备途径与机理研究。本项目拟利用引发式化学气相沉积（iCVD）法干式镀膜、过程温和可控的优势，采用复合接枝（hybrid grafting）技术，在基底表面预沉积一层交联聚合物薄膜以达到较高的表面自由基密度，再引入过饱和单体气体，实现单体在基底表面成核，并诱导其在轴向上选择性生长，从而制备规则的聚合物纳米结构阵列。项目主要从聚合物纳米结构阵列的可控制备、形成机理、应用探索与阵列的材料体系拓展四个层面展开研究。通过本项目的研究，有望实现一种新型的聚合物纳米阵列可控制备技术，提出一套聚合物纳米阵列气相沉积生长的形成机制理论，开发一种基底普适、全干式、单步完成的超疏水、抗生物吸附纳米镀层制备方法，并为今后其他气相法制备功能聚合物纳米材料的研究提供指导。

本项目突破了传统化学气相沉积只能应用于无机一维纳米阵列材料制备而现有聚合物一维纳米材料制备较为繁琐复杂的局限，利用引发式化学气相沉积（iCVD）法干式镀膜、过程温和可控的优势，实现了聚合物一维纳米阵列材料的可控制备。在制备过程中，首先在基底表面预沉积一层交联聚合物薄膜以达到较高的表面自由基密度，再引入过饱和单体气体，实现单体在基底表面成核，并诱导其在轴向上选择性生长，从而制备规则的聚合物纳米结构阵列。项目主要从聚合物纳米结构阵列的可控制备、形成机理与应用探索三个层面展开研究。通过本项目的研究，实现了一种新型的聚合物纳米阵列可控制备技术，提出了一套对于聚合物纳米阵列气相沉积过程中的形成机制猜想并进行了初步论证，发展了一种基底普适可单步实现透明、超疏水、抗结冰、抗生物吸附、抗腐蚀纳米涂层的方法，并为今后其他气相法制备功能聚合物纳米材料的研究提供了指导。