氮气反应溅射的Ni/C和Ni/B4C多层膜研究

As the outstanding candidates, the material combinations of Ni/C and Ni/B4C are quite often studied as multilayer mirrors working in X-ray energy region. However, in practical applications, it is quite difficult to fabricate these multilayers, especially for samples with thin periodic thickness. As a result, the applications of Ni/C multilayers are hamped by the diffculities existing in the sample manufacture. In this project, Ni/C and Ni/B4C multilayers will be deposited by DC magnetron sputtering, and pure argon and nitrogen-argon gas mixture will be adopted respectively as the working gas. The optical performance, the interfacial microstructures and stress of Ni/C multilayers will be studied. For Ni/C and Ni/B4C multilayers grown by magnetron sputtering using pure argon, the optical performance and the interfacial microstructures will be investigated by varying the Ni, C and B4C layer thickness; For Ni/C and Ni/B4C multilayers grown by magnetron sputtering using nitrogen-argon gas mixture, the optical performance and the interfacial microstructures will be investigated by varying the mixing ratio which is defined as the partial pressure of N2 to the total pressure in the bottle. By analyzing the relationships between the stress and the microstructure, the stress of Ni/C and Ni/B4C multilayers will be investigated by varying the mixing ratio.

作为特殊的材料对组合，Ni/C和Ni/B4C多层膜光学元件在X射线波段具有重要的应用价值。然而，在实际应用中，其制备工艺复杂难度较大，特别是较小周期厚度的Ni/C多层膜难以镀制，因而限制其进一步的应用。本申请项目将对纯Ar条件和氮气反应溅射方法分别制备Ni/C和Ni/B4C多层膜，并对其光学性能、界面结构和应力等进行深入的研究。对于纯氩镀制的Ni/C和Ni/B4C多层膜，得到Ni/C和Ni/B4C多层膜光学性能和微观结构随Ni、C和B4C层厚度变化的规律；而对于氮气反应溅射镀制的Ni/C和Ni/B4C多层膜，得到Ni/C和Ni/B4C多层膜光学性能和微观结构随掺氮比例变化的规律。通过分析应力与微观结构的关系，找出Ni/C和Ni/B4C多层膜应力随掺氮比例变化的规律。

作为特殊的材料对组合，Ni/C和Ni/B4C多层膜光学元件在X射线波段具有重要的应用价值。然而，在实际应用中，其制备工艺复杂难度较大，特别是较小周期厚度的Ni/C多层膜难以镀制，因而限制其进一步的应用。本申请项目将对纯Ar条件和氮气反应溅射方法分别制备Ni/C和Ni/B4C多层膜，并对其光学性能、界面结构和应力等进行深入的研究。对于纯氩镀制的Ni/C和Ni/B4C多层膜，得到Ni/C和Ni/B4C多层膜光学性能和微观结构随Ni、C和B4C层厚度变化的规律；而对于氮气反应溅射镀制的Ni/C和Ni/B4C多层膜，得到Ni/C和Ni/B4C多层膜光学性能和微观结构随掺氮比例变化的规律。通过分析应力与微观结构的关系，找出Ni/C和Ni/B4C多层膜应力随掺氮比例变化的规律。